Yttria Stabilized Zirconia Ceramic Flow-splitting Nozzle Plate for Semiconductor
This Ysz Ceramic Nozzle Plate is manufactured using Yttria-Stabilized Zirconia (YSZ) precision ceramic material, with 3 mol% yttria-partially stabilized tetragonal zirconia polycrystal (3Y-TZP) serving as the core substrate. It is produced through isostatic pressing, high-temperature sintering, and precision machining. Designed for high-end applications such as semiconductor etching equipment, plasma processing chambers, and precision gas distribution systems, the plate combines ultra-high fracture toughness, excellent wear resistance, and superior thermal shock resistance with a precision micro-pore distribution structure. It ensures uniform, stable, and long-lasting gas distribution and plasma control, even under conditions involving highly corrosive plasma environments, high temperatures and pressures, and rapid thermal cycling.
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IPv6 network supported
